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Physics - General & Miscellaneous, Materials Science - General & Miscellaneous, Electronics - Circuits - Integrated, Electronics - Microelectronics, Technical & Industrial Chemistry, Electronics - Semiconductors
Chemical Vapor Deposition for Microelectronics: Principles, Technology and Applications by Arthur Sherman — book cover

Chemical Vapor Deposition for Microelectronics: Principles, Technology and Applications

by Arthur Sherman
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Overview

Presents an extensive, comprehensive study of chemical vapor deposition (CVD). Understanding CVD requires knowledge of fluid mechanics, plasma physics, chemical thermodynamics, and kinetics as well as homogenous and heterogeneous chemical reactions. This text presents these aspects of CVD in an integrated fashion, and also reviews films for use in integrated circuit technology.

Synopsis

Presents an extensive, comprehensive study of chemical vapor deposition (CVD). Understanding CVD requires knowledge of fluid mechanics, plasma physics, chemical thermodynamics, and kinetics as well as homogenous and heterogeneous chemical reactions. This text presents these aspects of CVD in an integrated fashion, and also reviews films for use in integrated circuit technology.

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Book Details

Published
June 1, 1988
Publisher
Elsevier Science
Pages
215
Format
Hardcover
ISBN
9780815511366

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