Physics - General & Miscellaneous, Physical & Theoretical Chemistry, Nanotechnology, Solid State Physics - Thin Films, Electronics - Microelectronics, Technical & Industrial Chemistry, Electronics - Semiconductors, Solid State Physics - General & Miscella

Film Deposition by Plasma Techniques

Name: Film Deposition by Plasma Techniques
Author: Mitsuharu Konuma
ISBN: 9783642845130

by Mitsuharu Konuma

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Overview

This book describes the technology and applications of thin-film deposition by plasma techniques. The properties of thin films depend strongly on the deposition technique and the conditions that are used, with films produced by plasma techniques being superior to those produced by traditional methods in many ways. Plasma techniques have already been applied in the manufacture of semiconductors and electronic components, and the range of applications is expanding rapidly. The first half of this book deals with the foundations of plasma science, while the second half treats specific techniques: sputter deposition, ion plating, plasma enhanced chemical vapor deposition, plasma polymerization and plasma surface treatments. This text is an introduction to the subject but also includes details of the latest techniques and new results.

Synopsis

Properties of thin films depend strongly upon the deposition technique and conditions chosen. In order to achieve the desired film, optimum deposition conditions have to be found by carrying out experiments in a trial-and error fashion with varying parameters. The data obtained on one growth apparatus are often not transferable to another. This is especially true for film deposition processes using a cold plasma because of our poor under standing of the mechanisms. Relatively precise studies have been carried out on the role that physical effects play in film formation such as sputter deposition. However, there are many open questions regarding processes that involve chemical reactions, for example, reactive sputter deposition or plasma enhanced chemical vapor deposition. Much further research is re quired in order to understand the fundamental deposition processes. A sys tematic collection of basic data, some of which may be readily available in other branches of science, for example, reaction cross sections for gases with energetic electrons, is also required. The need for pfasma deposition techniques is felt strongly in industrial applications because these techniques are superior to traditional thin-film deposition techniques in many ways. In fact, plasma deposition techniques have developed rapidly in the semiconductor and electronics industries. Fields of possible application are still expanding. A reliable plasma reactor with an adequate in situ system for monitoring the deposition conditions and film properties must be developed to improve reproducibility and pro ductivity at the industrial level.