Materials Science - General & Miscellaneous, Optics - General & Miscellaneous, Crystallography, Optics - Lasers & Holography
Process Technology for Semiconductor Lasers: Crystal Growth and Microprocesses
Kenichi Iga, Susumu Kinoshita
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Overview
A description of the design principles, seen mainly from the fabrication point of view. Following a review of the historical development and of the materials used in lasing at short to long wavelengths, the book goes on to discuss the basic design principles for semiconductor-laser devices and the epitaxy for laser production. One entire chapter is devoted to the technology of liquid-phase epitaxy, while another treats vapor-phase and beam epitaxies. The whole is rounded off with mode-control techniques and an introduction to surface-emitting lasers.Synopsis
Process Technology for Semiconductor Lasers describes the design principles of semiconductor lasers, mainly from the fabrication point of view. A review is given of the history of semiconductor-laser development and applications and of the materials used in lasing at short to long wavelengths. The basic design principles for semiconductor-laser devices and the epitaxy for laser production are discussed. An entire chapter is devoted to the technology of liquid-phase epitaxy, and another one to vapor-phase and beam epitaxies. The characterizations of laser materials and the fabrication and characteristics of semiconductor lasers are treated. Mode-control techniques are presented, and surface-emitting lasers are introduced in the final chapter.Book Details
Published
December 21, 2011
Publisher
Springer-Verlag New York, LLC
Pages
179
Format
Paperback
ISBN
9783642795787