Progress in SOI Structures and Devices Operating at Extreme Conditions
Francis Balestra (Editor), Vladimir S. Lysenko (Editor), Alexei N. NazarovBooks.org participates in affiliate programs including Bookshop.org and the Amazon Services LLC Associates Program. We may earn a commission from qualifying purchases made through links on this page, at no additional cost to you.
Synopsis
Innovation in material technologies, the reliability of silicon-on- insulator (SOI) devices operating at harsh conditions, characterization of advanced SOI materials and devices, and perspectives on SOI structures and devices are examined in these papers from an October 2000 workshop. SIMOX and ELTRAN technologies are described, low- and high-temperature operation of deep submicron MOSFETs are examined, and laser-recrystallized SOI layers, ultra-short SOI MOSFETs, gated diodes, and SOI devices are investigated. Annotation (c)2003 Book News, Inc., Portland, OR