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Electronics - Circuits - VLSI, Chemical Elements, Electronics - Semiconductors, Solid State Physics - General & Miscellaneous
Silicon Processing for the VLSI Era: Process Technology, Second Edition, Vol. 1 by Stanley Wolf β€” book cover

Silicon Processing for the VLSI Era: Process Technology, Second Edition, Vol. 1

by Stanley Wolf, Richard N. Tauber
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Overview

Silicon Processing For The VLSI Era is a 3 volume treatise which provides a comprehensive, up-to-date treatment of this technology. Volume 1 covers the details of individual process steps used in fabricating silicon ICs. Volume 2 describes how these process steps are combined to make VLSI and ULSI structures. Volume 3 discusses the physics of MOS devices, emphasizing the link between submicron MOSFETs and their manufacturing processes. The books are an outgrowth of a set of intensive seminars conducted through the University of California Berkeley, Engineering Extension, for the past fifteen years. Over four thousand engineers and managers from more than 75 companies and government agencies have taken these courses since they were first presented in 1984.

Synopsis

The Second Edition of Volume 1 has been extensively rewritten and brougt up to date. Its length has been increased from 660 to over 900 pages. It contains more than 600 illustrations, 200 problems, and 1000 references (a large fraction from 1996 to 1999 sources). It is written in the same lucid and user-friendly style as the first edition. The following "hot" process technologies are covered in detail. This book also has a full money-back guarantee!

  • 300 mm wafers
  • Chemical-Mechanical Polishing (CMP)
  • Stepper-Scanners
  • Copper Interconnects
  • Low-k Dielectrics
  • Chemically-Amplified (CA) Resists
  • Cobalt and Titanium Salicides
  • Phase-Shift Masking (PSM)
  • High Density Plasma (HDP) Sources
  • Optical Proximity Correction (OPC)
  • Next Generation Lithography (NGL)
  • Ionized Metal Sputtering
  • Ozone:TEOS Dielectric Films
  • Thin Gate Oxides Off
  • Axis Illumination
  • Transient Enhanced Diffusion (TED)
  • Diffusion Barriers for Cu (Ta, TaN, TiN)
  • ARCs (BARCs, TARs)
  • Ultra-Low & High-Energy Ion Implantation
  • Dual-Damascene Interconnects

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Book Details

Published
September 1, 2000
Publisher
Lattice Press
Pages
952
Format
Hardcover
ISBN
9780961672164

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