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Silicon VLSI Technology : Fundamentals, Practice, and Modeling by James D. Plummer — book cover

Silicon VLSI Technology : Fundamentals, Practice, and Modeling

by James D. Plummer
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Overview

Unique in approach, this book provides an integrated view of silicon technology—with an emphasis on modern computer simulation. It describes not only the manufacturing practice associated with the technologies used in silicon chip fabrication, but also the underlying scientific basis for those technologies.

FEATURES/BENEFITS

  • Extensive use of modern computer simulation methods and examples—Integrated into each chapter.
    • Illustrates how technologies work. Allowing the reader to develop a better physical understanding of concepts and helps them in visualizing features of the technologies that are not easily seen any other way.
  • Early, broad exposure to a complete chip manufacturing process (Ch. 2).
    • Ties many diverse processing concepts together and establishes the context for the specific technologies discussed in later chapters.
  • Examples of modern manufacturing practice.
    • Providing readers with practical examples of fundamental concepts.
  • Historical perspective and introduction.
  • An integrated view of silicon technologywith an emphasis on modern computer simulation.
  • Extensive use of modern computer simulation methods and examples—integrated into each chapter.
  • Early, broad exposure to a complete chip manufacturing process.
  • Examples of modern manufacturing practice.

Synopsis

Unique in approach, this book provides an integrated view of silicon technology—with an emphasis on modern computer simulation. It describes not only the manufacturing practice associated with the technologies used in silicon chip fabrication, but also the underlying scientific basis for those technologies.

Modern CMOS Technology. Crystal Growth, Wafer Fabrication and Basic Properties of Silicon Wafers. Semiconductor Manufacturing—Clean Rooms, Wafer Cleaning and Gettering. Lithography. Thermal Oxidation and the Si/SiO<V>2 Interface. Dopant Diffusion. Ion Implantation. Thin Film Diffusion. Etching. Backend Technology.

For anyone interested in Fabrication Processes.

About the Author, James D. Plummer

JAMES D. PLUMMER, PETER B. GRIFFIN, and MICHAEL D. DEAL, all of Stanford University

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Book Details

Published
July 1, 2000
Publisher
Prentice Hall
Pages
817
Format
Paperback
ISBN
9780130850379

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